Single-target sputter deposition and post-processing of perovskite lead titanate thin films

The growth of ferroelectric lead titanate (PT) thin films by RF magnetron sputtering using a single mixed-oxide target is described. This study has been focused on producing perovskite thin (2000 Å) films with the desired composition on different substrates. Depositions were performed at room temperature and the process gas is pure argon. The effects of deposition and post-annealing conditions on film composition and microstructure were evaluated. Optimization of process conditions is discussed in terms of stoichiometry, structure and reproducibility. The optical properties of the films have also been characterized.