| 反应磁控溅射制备高阈值激光反射膜的研究进展 |
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| 引用本文： | 黄常刚,何智兵,王朝阳,唐永建.反应磁控溅射制备高阈值激光反射膜的研究进展[J].材料导报,2006,20(Z2):309-311. |
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| 作者姓名： | 黄常刚 何智兵 王朝阳 唐永建 |
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| 作者单位： | 1. 西南科技大学材料科学与工程学院,绵阳,621002;中国工程物理研究院激光聚变研究中心,绵阳,621002
2. 中国工程物理研究院激光聚变研究中心,绵阳,621002 |
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| 基金项目： | 中国工程物理研究院基金 |
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| 摘 要： | 反应磁控溅射广泛应用于制备光学薄膜.分析了高阈值激光反射膜膜层材料的选择及膜系设计,比较了目前制备高阈值激光反射膜的几种常用方法.重点论述了反应磁控溅射制备高阈值激光反射膜需要解决的两个问题:工作点的选择及控制方法;反应磁控溅射中的打火、靶中毒及阳极消失.并且提出了相应的解决方案.阐述了影响激光反射膜损伤阈值的因素以及反应磁控溅射制备高阈值激光反射膜的优势.
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| 关 键 词： | 反应磁控溅射 膜系设计 阈值 激光反射膜 进展 |
Progress in Laser Reflective Film with High Damage Threshold |
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| HUANG Changgang,HE Zhibing,WANG Chaoyang,TANG Yongjian.Progress in Laser Reflective Film with High Damage Threshold[J].Materials Review,2006,20(Z2):309-311. |
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| Authors: | HUANG Changgang HE Zhibing WANG Chaoyang TANG Yongjian |
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| Abstract: | Reactive magnetic sputtering (RMS) is widely used in optical coating preparation. The material choosing and coating designing are discussed in this paper. At the same time, several methods for laser reflective film preparation are compared. Two kinds of problem should be solved when preparing laser reflective film by RMS. First is how to choose and control the work point. Second is how to deal with arcing, target poison and disappearing anode. The factors that affect the damage threshold and the advantage of RMS in laser reflective film preparation are also discussed. |
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| Keywords: | RMS coating designing threshold laser reflective film advance |
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