| PEM控制中频反应磁控溅射制备TiO_2薄膜的研究 |
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| 引用本文： | 王治安,王军生,重洪辉.PEM控制中频反应磁控溅射制备TiO_2薄膜的研究[J].真空,2011,48(4). |
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| 作者姓名： | 王治安 王军生 重洪辉 |
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| 作者单位： | 核工业西南物理研究院,四川成都,610041 |
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| 摘 要： | 采用中频反应磁控溅射孪生靶在玻璃基体上沉积TiO2薄膜。沉积过程中采用多路送气和等离子体发射光谱监测控制系统,使整个反应溅射过程维持在过渡区,从而快速稳定获得均匀高质量的TiO2薄膜,沉积速度在50 nm/min以上。随着SP值的增加,沉积速率的增加呈线性关系。通过比较不同SP值制备的TiO2薄膜的光谱图发现,快速稳定地沉积TiO2薄膜的SP值大致在2.5~3.8范围内。
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| 关 键 词： | TiO2 孪生靶 过渡区 PEM |
Study on the TiO_2 films deposited by medium-frequency reactive magnetron sputtering under PEM |
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| WANG Zhi-an,WANG Jun-sheng,TONG Hong-hui.Study on the TiO_2 films deposited by medium-frequency reactive magnetron sputtering under PEM[J].Vacuum,2011,48(4). |
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| Authors: | WANG Zhi-an WANG Jun-sheng TONG Hong-hui |
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| Affiliation: | WANG Zhi-an,WANG Jun-sheng,TONG Hong-hui(Southwest Institute of Physics,Chengdu 610041,China) |
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| Abstract: | Titanium dioxide(TiO2) films were deposited on unheated glass substrates by medium-frequency reactive magnetron sputtering process with twin Ti target.To achieve a deposition rate over 50nm/min which is much higher than that by other processes,the stable and quick deposition proceeded in a 'transition region' via an advanced multichannel reactive plasma gas control system,i.e.,the plasma emission monitoring(PEM),thus obtaining the homogeneous TiO2 films.With the increasing SP value,the increase in depositio... |
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| Keywords: | TiO2 twin target transition region PEM |
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