| 非高斯束多功能电子束曝光机的电子光柱体设计 |
| |
| 引用本文： | 吴亚军,王建琨. 非高斯束多功能电子束曝光机的电子光柱体设计[J]. 山东大学学报(工学版), 1989, 0(2) |
| |
| 作者姓名： | 吴亚军 王建琨 |
| |
| 作者单位： | 山东工业大学电机工程系，山东工业大学电机工程系 1984级硕士研究生 北京大学攻读博士学位 |
| |
| 摘 要： | 讨论目前电子束曝光机的基本结构和复合聚焦偏转系统的基本原理,并根据这一原理对已有的复合系统如MOL,VAL,PFDS等进行了研究。推导了双通道复合系统的象差公式,提出了设计广义变轴复合系统的方法。对其构成方式进行了讨论,具体设计出一个广义变轴复合系统。并推导了双通道复合系统的偏转场计算公式,设计了一个双静电偏转场双物镜复合系统。
|
| 关 键 词： | 电子束 电子光学 象差 物镜 计算机辅助设计 |
OPTIC COLUMN DESIGN OF ELECTRON BEAM LITHOGRAPHY MACHINE WITH NON-GAUSSIAN BEAM AND VARIOUS FUNCTIONS |
| |
| Wu Yajun Wang Jiankun. OPTIC COLUMN DESIGN OF ELECTRON BEAM LITHOGRAPHY MACHINE WITH NON-GAUSSIAN BEAM AND VARIOUS FUNCTIONS[J]. Journal of Shandong University of Technology, 1989, 0(2) |
| |
| Authors: | Wu Yajun Wang Jiankun |
| |
| Affiliation: | Dept. of Elect. Eng. |
| |
| Abstract: | The basic structure of electron beam lithography machine and the basic principles of dual-channel combined focusing deflecting system for examplc, MOL, VAL, PFDS etc was discussed. A method to design the general variable axial lens combined system (GVAL) was raised. The equations for computing deflection field and aberrations of the dual-channel combined system are derived. A double-lens-double-deflector system has been designed. |
| |
| Keywords: | Electron beam Electron optics Aberration Objective Computer aided design |
| 本文献已被 CNKI 等数据库收录！ |
|
