Deposition and surface treatment with intense pulsed ion beams |
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Authors: | J C Olson H A Davis D J Rej W J Waganaar R W Stinnett D C Mc Intyre |
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Affiliation: | (1) Los Alamos National Laboratory, 87545 Los Alamos, NM;(2) Sandia National Laboratories, 87185 Albuquerque, NM |
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Abstract: | Intense pulsed ion beams (500 keV, 30 kA, 0.5 μs) are being investigated for materials processing. Demonstrated and potential
applications include film deposition, glazing and joining, alloying and mixing, cleaning and polishing, corrosion improvement,
polymer surface treatments, and nanophase powder synthesis. Initial experiments at Los Alamos have emphasized thin-film formation
by depositing beam ablated target material on substrates. We have deposited films with complex stoichiometry such as YBa2Cu3O7−x and formed diamond-like-carbon films. Instantaneous deposition rates of 1 mm/s have been achieved because of the short ion
range (typically 1 μm), excellent target coupling, and the inherently high energy of these beams. Currently the beams are
produced in single shot uncomplicated diodes with good electrical efficiency. High-voltage modulator technology and diodes
capable of repetitive firing, needed for commercial application, are being developed. |
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Keywords: | Diamond-like-carbon films film deposition intense pulsed ion beams |
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