Fine Patterning and Characterization of Gel Films Derived from Methyltriethoxysilane and Tetraethoxysilane |
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| Authors: | Atsunori Matsuda Yoshihiro Matsuno Masahiro Tatsumisago Tsutomu Minami |
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| Affiliation: | Department of Applied Materials Science, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan;and;Tsukuba Research Center, Nippon Sheet Glass Co., Ltd., Tokodai, Tsukuba, Ibaraki 300-2635, Japan |
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| Abstract: | Pregrooves of 1.6 µm pitch for optical data storage have been embossed successfully by pressing a stamper against x CH3Si(OC2H5)3(100 - x )Si(OC2H5)4-derived gel films (60 ≤ x ≤ 100 mol%) on glass-disk substrates of 130 mm diameter. When x is <40 mol%, the resultant films are too hard to emboss patterns uniformly. The shrinkage of the patterns is ～4% for all the films when 60 lessthan equal to x lessthan equal to 100 mol%, even after heat treatment at 350°C, so that the nearly net negative shape of the stamper is preserved. The methyl groups in the films decompose at temperatures from 500° to 600°C. |
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