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Analysis and Modelling of the LPC VD Annular Reactor |
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| Authors: | S Bismo P Duverneuil L Pibouleau S Domenech J -P Couderc |
| Affiliation: | a ENSIGC - URA CNRS 192, Toulouse Cedex, France |
| Abstract: | This paper presents the results of our work on a new type of CVD reactor, annular reactor. This equipment is able to deposit pure silicon and also in-situ phosphorus doped silicon on a large number of substrates |
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