| 高速钢W18Cr4V离子渗氮层组织对TiN膜与基体结合强度的影响 |
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| 引用本文： | 谢飞,何家文. 高速钢W18Cr4V离子渗氮层组织对TiN膜与基体结合强度的影响[J]. 金属学报, 2000, 36(10): 1099-1103 |
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| 作者姓名： | 谢飞 何家文 |
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| 作者单位： | 1. 江苏石油化工学院机械工程系,常州,213016;西安交通大学材料科学与工程学院,西安,710049
2. 西安交通大学材料科学与工程学院,西安,710049 |
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| 基金项目： | 国家自然科学基金资助项目19392300-5 |
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| 摘 要： | 采用Ｗ１８Ｃｒ４Ｖ高速钢进行离子渗氮－ＰＥＣＶＤ ＴｉＮ复合处理，运用透射电子显微镜、Ｘ射线衍射仪和光学显微镜研究试样的表层组织结构。采用连续压入法研究ＴｉＮ膜与基体的结合强度，结果表明，离子渗氮能够提高膜基结合强度，通过分析渗氮层与膜－基界面的组织特点，认为ＴｉＮ膜在渗氮层上一些与其具有相同或相似晶体结构的氮化物上外延生长，以及强度较高的渗氮层对膜的支撑是基体渗氮提高膜－基结合强度的两大因素。
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| 关 键 词： | 高速钢 离子渗氮 结合强度 TiN膜 DECVD |
| 文章编号： | 0412-1961(2000)10-1099-05 |
| 修稿时间： | 2000-04-03 |
THE INFLUENCE OF THE NITRIDED LAYER STRUCTURE OF W18Cr4V HIGH SPEED STEEL ON THE BONDING STRENGTH OF PECVD TiN FILMS |
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| XIE Fei,HE Jiawen. THE INFLUENCE OF THE NITRIDED LAYER STRUCTURE OF W18Cr4V HIGH SPEED STEEL ON THE BONDING STRENGTH OF PECVD TiN FILMS[J]. Acta Metallurgica Sinica, 2000, 36(10): 1099-1103 |
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| Authors: | XIE Fei HE Jiawen |
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| Abstract: | Duplex treatment of plasma nitriding-PECVD TiN films was employed for W18Cr4V high speed steel. The phases and structure of the surface layer treated were analysed with transmission electron microscopy (TEM), X-ray distraction (XRD), and optical microscopy. The bonding strength between the films and the substrate was measured by continuous indentation loading. The results show that the plasma nitriding results in an increase of the bonding strength between the films and the substrate. By analyzing characteristics of the nitrided layers and the boundaries between the films and the substrates, it is proposed that two factors, epitaxial growth of the films on some nitrides which have the same or similar crystal structure as TiN and strong support by the nitrided layer, are responsible for improving the bonding strength. |
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| Keywords: | high speed steel plasma nitriding PECVD TiN bonding strength |
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