Incorporation of carbon nanotube into direct-patternable ZnO thin film formed by photochemical solution deposition |
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| Authors: | Hyuncheol Kim Hyeong-Ho Park Hyeongtag Jeon Ho Jung Chang Youngchul Chang Hyung-Ho Park |
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| Affiliation: | 1. Department of Ceramic Engineering, Yonsei University, Seoul 120-749, Republic of Korea;2. Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Republic of Korea;3. Department of Electronics Engineering, Dankook University, Cheonan-Si, Chungnam 330-714, Republic of Korea;4. Department of Mechatronics Engineering, Korea University of Technology and Education, Cheonan-Si, Chungnam 330-708, Republic of Korea |
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| Abstract: | Direct-patterning of ZnO hybrid films containing MWNT was realized without using photoresist and dry etching. Photosensitive 2-nitrobenzaldehyde was introduced into the solution precursors as a stabilizer and contributed to form a cross-linked network structure during photochemical reaction. According to the incorporation of multi-walled nanotube (MWNT) into ZnO films, the transmittance of ZnO hybrid film containing MWNT did not change but the sheet resistance was improved due to the enhancement of charge mobility due to π-bonding nature of MWNT. These results suggested a possibility that a micro-patterned system can be fabricated relatively easily and without high-cost processes, for example, by conventional etching procedure. |
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| Keywords: | A. Sol&ndash gel processes B. Composites C. Electrical properties C. Optical properties |
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