Optimization of L10-FePt/MgO/CrRu thin films for next-generation magnetic recording media |
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| Authors: | R Fernandez N AmosC Zhang B LeeS Khizroev |
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| Affiliation: | Department of Electrical Engineering, University of California-Riverside, 900 University Ave., Riverside, California 92521, USA |
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| Abstract: | L10-FePt thin films were deposited on silicon substrates with the structure of Si/CrRu/MgO/FePt. The magnetic and microstructural properties were optimized by varying the FePt sputter pressure and temperature, as well as the thicknesses of all three layers. High coercivity films greater than 1.8 T were grown when the FePt sputter pressure was at 1.33 Pa with a thickness of only 4 nm, on CrRu and MgO underlayers as thin as 10 nm and 2 nm, respectively. |
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| Keywords: | FePt Perpendicular magnetic recording Sputter deposition |
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