Plasmaborieren – Untersuchungen zum Einfluß der Glimmentladung beim Borieren in einer BCl3‐H2‐Ar‐Atmosphäre

Plasma Boriding – Influence of Glow Discharge Conditions Using a BCl₃‐H₂‐Ar‐Atmosphere The plasma boriding process using BCl₃‐H₂‐Ar‐atmosphere is analized by characterisation of glow discharge conditions using optical emission spectroscopy. Additional exhaust‐examination by mass spectrometry depending on treatment parameters contributes to the determination of the reaction mechanisms. Effects that have influence on plasma boriding using BCl₃ are investigated by comparison of the treatment results with the characterisation of the glow discharge. The etching mechanism on the substrate surface can be effectively reduced selecting optimised parameters. So the plasma boriding process using BCl₃‐precursor gets interesting for industrial application.