| 氢等离子体处理金刚石成核面 |
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| 引用本文： | 马志斌,吴建鹏,湛玉龙,曹为,李国伟,潘鑫. 氢等离子体处理金刚石成核面[J]. 武汉工程大学学报, 2012, 34(7): 33-36 |
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| 作者姓名： | 马志斌 吴建鹏 湛玉龙 曹为 李国伟 潘鑫 |
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| 作者单位： | 武汉工程大学材料科学与工程学院,湖北省等离子体化学与新材料重点实验室,湖北武汉430074 |
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| 基金项目： | 国家自然科学基金项目(10875093) |
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| 摘 要： | 通过用氢等离子体对微波等离子体化学气象沉积法在钼基体上制备的金刚石厚膜的成核面进行表面处理,并利用拉曼光谱、扫描电镜和X射线光电子能谱对处理前后金刚石成核面进行表征,比较了处理前后金刚石成核面金刚石相含量、表面粗糙组度,并分析了薄膜中钼原子的化合态及百分含量.结果表明:经过氢等离子体处理后的金刚石成核面的金刚石相含量提高,表面粗糙度增大,钼原子的百分含量由1.64%变为0.83%,且能有效还原成核面上钼的氧化物生成碳化钼和碳化二钼.
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| 关 键 词： | 氢等离子体 金刚石厚膜 化合态 |
Treating nucleation surface of diamond thick film with hydrogen plasma |
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| MA Zhi-bin , WU Jian-peng , ZHAN Yu-long , CAO Wei , LI Guo-wei , PAN Xin. Treating nucleation surface of diamond thick film with hydrogen plasma[J]. Journal of Wuhan Institute of Chemical Technology, 2012, 34(7): 33-36 |
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| Authors: | MA Zhi-bin WU Jian-peng ZHAN Yu-long CAO Wei LI Guo-wei PAN Xin |
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| Affiliation: | (School of Material Science and Engineering,Key Laboratory of Plasma Chemical and Advanced Materials of Hubei Province,Wuhan Institute of Technology,Wuhan 430074,China) |
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| Abstract: | The nucleation surface of the diamond thick film prepared by microwave plasma chemical vapor deposition(MPCVD) on Mo substrate was treated by hydrogen plasma.In order to compare the diamond content and surface roughness of the nucleation surface and analyze combination state and percentage composition of Mo atom,the diamond thick film was investigated using Raman spectroscopy,scanning electron microscope(SEM) and X-ray photoelectron spectroscopy(XPS).The results show that the diamond content and the roughness of the nucleation surface have increased,the percentage content of Mo atoms decreases from 1.64% to 0.83%,and the oxide of Mo on the nucleation surface can effectively be restored and form MoC and Mo2C. |
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| Keywords: | hydrogen plasma diamond thick film combination state |
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