| SiCw／涂层／TZP陶瓷复合材料界面化学键的XPS和IR研究 |
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| 引用本文： | 张宗涛,黄勇.SiCw／涂层／TZP陶瓷复合材料界面化学键的XPS和IR研究[J].硅酸盐学报,1994,22(1):92-96. |
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| 作者姓名： | 张宗涛 黄勇 |
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| 作者单位： | 清华大学材料科学与工程系 |
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| 摘 要： | 本文用ＸＰＳ和ＩＲ测定了ＳｉＣｗ／（Ａｌ２Ｏ３，莫来石）涂层／ＴＺＰ陶瓷复合材料的界面化学键。结果表明ＳｉＣｗ／Ａｌ２Ｏ３、莫来石、ＴＺＰ界面为化学结合而Ａｌ２Ｏ３、莫来石／ＴＺＰ界面为物理结合。
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| 关 键 词： | 碳化硅晶须 氧化锆 陶瓷 涂层 |
XPS AND IR STUDY ON CHEMICAL BONDS AT THE INTERFACES OF SiC_w/COATINGS/TZP COMPOSITES |
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| Huang Yong,.XPS AND IR STUDY ON CHEMICAL BONDS AT THE INTERFACES OF SiC_w/COATINGS/TZP COMPOSITES[J].Journal of The Chinese Ceramic Society,1994,22(1):92-96. |
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| Authors: | Huang Yong |
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| Abstract: | Chemical bonds at the interfaces of SiC_w/(Al_2O_3,mullite )coatings /TZP composites were analyzedby X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The experimental resultsshow that chemical bonds are formed at the interfaces between SiC_w and Al_2O_3 (or mullite,TZP)and that physicalbonds exist at the interfaces between Al_2O_3 or mullite and TZP. |
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| Keywords: | silicon carbide whisker tetragonal zirconia polycrystals coating interface chemical bond XPS IR |
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