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Microwave ECR plasma CVD of cubic Y2O3 coatings and their characterization |
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| Authors: | SA Barve N Mithal N Chand LM Gantayet |
| Affiliation: | a Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India b Technical Physics and Prototype Engineering Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India c High Pressure Physics Division, Bhabha Atomic Research Center, Trombay, Mumbai 400 085, India d Institute of Chemical Technology, University of Mumbai, Mumbai 400 019, India |
| Abstract: | Yttrium oxide (Y2O3) thin films are deposited by microwave electron cyclotron resonance (ECR) plasma assisted metal organic chemical vapour deposition (MOCVD) process at a substrate temperature of 350 °C using indigenously developed metal organic precursors (2,2,6,6-tetra methyl-3,5-heptane dionate) yttrium, commonly known as Y(thd)3 synthesized by ultrasound method. The deposited coatings are characterized by X-ray photoelectron spectroscopy, glancing angle X-ray diffraction, scanning electron microscopy, EDS and infrared spectroscopy. The characterization results indicate that it is possible to deposit non-porous coatings with excellent uniformity of a single phase cubic Y2O3 on various substrates by this process at reasonably low substrate temperature that is desirable in various manufacturing processes. |
| Keywords: | Y2O3 MOCVD XPS ECR |
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