| 激光诱导等离子体淀积薄膜过程的研究 |
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| 引用本文： | 张贵银,荆一东. 激光诱导等离子体淀积薄膜过程的研究[J]. 西华大学学报(自然科学版), 2001, 20(4): 66-67 |
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| 作者姓名： | 张贵银 荆一东 |
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| 作者单位： | 华北电力大学,河北,保定,071003 |
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| 摘 要： | 用激波理论推出了激光诱导等离子体化学气相淀积过程中两个重要参量薄膜面积、膜淀积速率的表达式.分析了激光强度、气体压强、基片温度对淀积过程的影响,为最佳淀积条件的选取提供了理论依据.
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| 关 键 词： | 等离子体 气相淀积 薄膜面积 淀积速率 |
| 文章编号： | 1000-5722(2001)04-0066-02 |
| 修稿时间： | 2001-05-16 |
Study on Process of Film Deposited by Laser Plasma |
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| ZNANG Gui yin JIN Yi dong. Study on Process of Film Deposited by Laser Plasma[J]. Journal of Xihua University(Natural Science Edition), 2001, 20(4): 66-67 |
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| Authors: | ZNANG Gui yin JIN Yi dong |
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| Abstract: | Two important parameters in the process of laser induced plasma chemical vapor deposition film size and deposition rate are deduced with shock wave theory The influence of laser intensity,atmosphere and pedestal temperature on the deposition process is analysed |
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| Keywords: | plasma vapor deposition film size deposition rate |
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