首页 | 本学科首页   官方微博 | 高级检索  
     

Microstructure and High-Temperature Oxidation Behavior of Dy-Doped Nb–Si-Based Alloys
摘    要:Microstructures and oxidation behaviors of four Dy-doped Nb–Si-based alloys at 1250℃ were investigated. The nominal compositions of the four alloys are Nb–15Si–24Ti–4Cr–2Al–2Hf–xDy(at.%), where x = 0, 0.05, 0.10 and 0.15,respectively. Results showed that the four alloys all consisted of Nbss, αNb_5Si_3 and γNb_5Si_3, and the addition of Dy produced no obvious effect on the phase constitution and the microstructures of Nb–Si-based alloys. After oxidation at 1250℃ for 58 h, it was found that the addition of Dy accelerated the oxidation rate of Nb–Si-based alloys and caused a larger weight gain, accompanied by the formation of a more porous and less protective oxide scale. The oxides of Nb_2O_5,Ti_2Nb_(10)O_(29), TiNb_2O_7, Ti_(0.4)Cr_(0.3)Nb_(0.3)O_2 and glassy SiO_2 were formed on Dy-doped Nb–Si-based alloys. The hightemperature oxidation mechanism of Dy-doped Nb–Si-based alloys was discussed.

收稿时间:2017-10-03
本文献已被 CNKI 等数据库收录!
点击此处可从《金属学报(英文版)》浏览原始摘要信息
点击此处可从《金属学报(英文版)》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号