Annealing studies of photoluminescence spectra from multiple Er3+ centers in er-implanted GaN |
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Authors: | S. Kim S. J. Rhee X. Li J. J. Coleman S. G. Bishop |
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Affiliation: | (1) Microelectronics Laboratory and Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, 61801 Urbana, IL |
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Abstract: | A study of selectively excited photoluminescence (PL) at ∼ 6K in Er-im planted GaN as a function of annealing temperature (400–1000°C) has detected nine different Er3+ centers with distinct ∼ 1540 nm 4I13/2 → 4I15/2 Er3+ PL spectra and different activation temperatures. However, most of the optically active implanted Er atoms are incorporated at annealing temperatures as low as 400°C on a single type of center for which PL can only be excited efficiently by direct intra-4f shell absorption and is not strongly pumped by either above-gap or broad-band below-gap absorption. This strongly suggests that this high-concentration Er3+ center is an isolated, isoelectronic center consistent with Er3+ substituted on a Ga site. In contrast, a very small fraction of the Er atoms that form a variety of Er-defect/impurity complexes dominate the Er3+ emission spectra excited by above-gap and broad-band below-gap absorption because of their larger cross sections for both carrier capture and optical absorption. |
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Keywords: | Activation Er GaN implantation photoluminescence (PL) |
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