首页 | 本学科首页   官方微博 | 高级检索  
     


Annealing studies of photoluminescence spectra from multiple Er3+ centers in er-implanted GaN
Authors:S. Kim  S. J. Rhee  X. Li  J. J. Coleman  S. G. Bishop
Affiliation:(1) Microelectronics Laboratory and Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, 61801 Urbana, IL
Abstract:A study of selectively excited photoluminescence (PL) at ∼ 6K in Er-im planted GaN as a function of annealing temperature (400–1000°C) has detected nine different Er3+ centers with distinct ∼ 1540 nm 4I13/24I15/2 Er3+ PL spectra and different activation temperatures. However, most of the optically active implanted Er atoms are incorporated at annealing temperatures as low as 400°C on a single type of center for which PL can only be excited efficiently by direct intra-4f shell absorption and is not strongly pumped by either above-gap or broad-band below-gap absorption. This strongly suggests that this high-concentration Er3+ center is an isolated, isoelectronic center consistent with Er3+ substituted on a Ga site. In contrast, a very small fraction of the Er atoms that form a variety of Er-defect/impurity complexes dominate the Er3+ emission spectra excited by above-gap and broad-band below-gap absorption because of their larger cross sections for both carrier capture and optical absorption.
Keywords:Activation  Er  GaN  implantation  photoluminescence (PL)
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号