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磁控溅射对锦纶拉伸性能的影响及镀膜形貌观察
引用本文:肖惠,郭兴峰,王西山. 磁控溅射对锦纶拉伸性能的影响及镀膜形貌观察[J]. 纺织学报, 2010, 31(5): 59-62
作者姓名:肖惠  郭兴峰  王西山
作者单位:天津工业大学纺织学院
基金项目:天津市科技发展计划项目 
摘    要:为研究磁控溅射对纺织材料性能的影响,利用JPGF-450I型磁控溅射镀膜机,以锦纶织物为基材,制备纳米铝膜。通过改变溅射功率、工作压强等工艺参数,获得在不同工艺条件下的镀铝膜锦纶织物,测试镀膜后锦纶织物中纱线的断裂强度、断裂功等拉伸性能,研究溅射功率与工作压强对镀膜织物中纱线拉伸性能的影响。结果表明:在室温下,镀膜纱线与原纱相比断裂强度有所提高,断裂强度不匀率降低,断裂功受断裂伸长率影响明显;随溅射功率的增加,镀膜纱线的断裂功和断裂伸长率都呈减小的趋势;工作压强在0.8~0.9Pa时,镀膜纱线的断裂功和断裂伸长率达到最大值。并通过AFM原子力显微镜观察了镀膜锦纶织物的表面形态发现,锦纶丝的表面形成了较完整均匀的纳米铝膜。

关 键 词:磁控溅射  铝膜  锦纶  拉伸性能  溅射参数
收稿时间:2009-04-17;

Tensile properties affected by magnetron sputtering on nylon yarn and surface morphology observation
XIAO Hui,GUO Xingfeng,WANG Xishan. Tensile properties affected by magnetron sputtering on nylon yarn and surface morphology observation[J]. Journal of Textile Research, 2010, 31(5): 59-62
Authors:XIAO Hui  GUO Xingfeng  WANG Xishan
Affiliation:School of Textiles, Tianjin Polytechnic University
Abstract:In order to assess the effect of magnetron sputtering on textile materials,nanometer aluminum thin film was deposited onto nylon fabric by DC magnetron sputtering at room temperature.Sample fabrics were obtained under different parameters including sputtering power and working pressure.By testing the breaking strength and breaking work of the yarn in the coated fabric,the influence of magnetron sputtering power and working pressure on the tensile properties of the yarn in the coated fabric was investigated.Compared with the original yarn's tensile properties,all the coated yarn's breaking tenacity was improved and its CV value was reduced,the breaking work was sensitive to the breaking elongation.With the increasing of sputtering power,both breaking work and breaking elongation decreased.At about 0.8-0.9 Pa,the breaking work and elongation reaches their maximum values.The surface morphology of sputter coated fabric were observed by atomic force microscopy (AFM).It revealed that a complete and uniform nanometer aluminum film was formed on the nylon fabric surface.
Keywords:magnetron sputtering  aluminum film  nylon  tensile property  sputtering parameter
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