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Microstructure control in Pb3Bi thin films for Josephson junctions
Authors:R. Chicault  J.C. Villegier  M.C. Rossi
Affiliation:1. Laboratoire de Spectrométrie Physique, BP53X-38041 Grenoble France;2. L.E.T.I. Commissariat a l''Energie Atomique 85X-38041 Grenoble, France
Abstract:Investigation of PbBi thin films deposited by thermal evaporation was made in the range of 22–40% of bismuth. Low temperature resistivity and critical superconductive temperature depend strongly on bismuth concentration.SIMS depth profiling, X-ray diffraction and TEM analysis allow us to identify the mixture of crystallized HCPPb3Bi phase and other surface and internal phases. Drastic oxidation effects were observed on these layers; some additional thin film materials, such as indium and SiO were deposited upon PbBi to reduce oxidation.Low leakage current, niobium-oxide-Pb3Bi junctions were made with these alloys as counter-electrodes.
Keywords:superconductivity  Josephson junction  lead-bismuth film
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