| 镀铂栅极抑制电子发射性能研究 |
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| 引用本文： | 蒋军 江炳尧 任琮欣 张福民 冯涛 王曦 柳襄怀 邹世昌. 镀铂栅极抑制电子发射性能研究[J]. 稀有金属材料与工程, 2005, 34(11): 1810-1813 |
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| 作者姓名： | 蒋军 江炳尧 任琮欣 张福民 冯涛 王曦 柳襄怀 邹世昌 |
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| 作者单位： | 中国科学院,上海微系统与信息技术研究所,上海,200050 |
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| 基金项目： | 国家重点基础研究发展规划项目“973”资助（G2000067207-2） |
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| 摘 要： | 利用离子束辅助沉积（IBAD）方法在Mo栅极表面上沉积Pt膜，采用试验二极管方法测量和比较阴极活性物质Ba，BaO蒸发到镀铂栅极和纯钼栅极表面上后的电子发射性能。采用XRD，EDX，XPS等测试手段对其栅极表面进行对比分析和表征。实验结果表明：镀铂栅极具有明显的抑制电子发射性能，并初步探讨了离子束辅助沉积Pt膜抑制栅电子发射的机理。
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| 关 键 词： | 电子发射 离子束辅助沉积 钼栅极 铂膜 |
| 文章编号： | 1002-185X(2005)11-1810-04 |
| 收稿时间： | 2004-07-12 |
| 修稿时间： | 2005-07-10 |
Electron Emission Suppression Characteristic of Molybdenum Grid Coated with Pt Film by Ion Beam Assisted Deposition |
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| Jiang Jun,Jiang Bingyao,Ren Congxin,Zhang Fumin,Feng Tao,Wang Xi,Liu Xianghuai,Zou Shichang. Electron Emission Suppression Characteristic of Molybdenum Grid Coated with Pt Film by Ion Beam Assisted Deposition[J]. Rare Metal Materials and Engineering, 2005, 34(11): 1810-1813 |
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| Authors: | Jiang Jun Jiang Bingyao Ren Congxin Zhang Fumin Feng Tao Wang Xi Liu Xianghuai Zou Shichang |
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| Affiliation: | Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China |
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| Abstract: | Platinum was deposited onto molybdenum grid by ion beam assisted deposition (IBAD). Electron emission behavior from molybdenum grids with and without Platinum contaminated by active electron emission substances (Ba, BaO) of the cathode were measured using analogous diode method. The characteristics on molybdenum grid coated with platinum film were analyzed by X-ray diffraction (XRD), energy dispersive X-ray (EDX) and X-ray photoelectron spectroscopy (XPS). The results show that the electron emission from the grid coated with platinum film is less than that without Platinum film, and the mechanism for suppression of the electron emission of molybdenum grid coated with Platinum film was discussed. |
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| Keywords: | electron emission ion beam assisted deposition Molybdenum grid Platinum film |
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