a-C:N膜的制备及结构分析

采用射频溅射法在锗衬底上沉积无定形碳氮膜 (a- C:N) ,用 X射线光电子谱 (XPS)、傅立叶变换红外光谱 (FT- IR)和喇曼光谱 (RS)分析了膜的成分与结构。结果表明 ,氮是以化学键的形式存在于膜中 ,且有三种不同的 C- N键合状态。随着反应气体中氮气分压的增加 ,a- C:N膜中氮浓度增加 ,C≡N键的含量增加。

Preparation and Structure Analysis of Amorphous Carbon Nitride Films

Amorphous carbon nitride films(a- C:N) have been grown on Ge substrate us- ing radio frequency sputtering of graphite in nitrogen and acetylene plasma. The structure and composition of a- C:N films were analyzed by X- ray photoelectron spectroscopy (XPS) ,infrared absorption (FT- IR) and Raman spectroscopies (RS) . The results indicate that the incorporated nitrogen is chemically bonded to carbon.The concentration of the incorporated nitrogen and triple bonded CN in a- C:N films increased with increasing of nitrogen content in mixture gas.