| 真空波导磁场控制型ECR溅射法的实验研究 |
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| 引用本文： | 汪建华,袁润章,喻宪辉,邬钦崇,任兆杏.真空波导磁场控制型ECR溅射法的实验研究[J].武汉理工大学学报,1998(3). |
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| 作者姓名： | 汪建华 袁润章 喻宪辉 邬钦崇 任兆杏 |
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| 作者单位： | 武汉工业大学(汪建华，袁润章)，湖北交通学院(喻宪辉)，中科院等离子体物理所(邬钦崇，任兆杏) |
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| 基金项目： | 国家自然科学基金!1917504． |
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| 摘 要： | 微波电子回旋共振（delectroncyclotronresonance．ECR）等离子体溅射法是能在低温下制备高质量薄膜的最新镀膜技术．在该技术中，微波输入窗口易受金属粒子污染，导致微波在窗口反射，从而影响装置的正常工作。本文初步探讨了在ECR溅射装置中．采用真空波导与共振腔连成一体，在连接处配置磁轭（纯铁）．通过改变共振腔与波导连接处的磁场分布，能有效的避免微波窗口污染的技术途径，并较细致的研究了该装置的放电特性。
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| 关 键 词： | ECR等离子体 溅射 真空波导 磁轭 |
Study of Magnetic Field Control Type ECR Sputtering Method Used Vaccum Waveguide |
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| Wang Jianhua,.Study of Magnetic Field Control Type ECR Sputtering Method Used Vaccum Waveguide[J].Journal of Wuhan University of Technology,1998(3). |
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| Authors: | Wang Jianhua |
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| Abstract: | Microwave electron cyclotron resonance (ECR) plasma sputtering method is a new technique used to synthesize good thinfilms in low temperature. In this technique,microwave quartz window can be easily contaminated by sputtering metal. This problembrings about microwave reflecting in quartz window and effects normal work of the apparatus. This paper initially inquires into the technique way of avoiding microwave quartz window contamination and researches plasma discharge Characteristics in this apparatus. |
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| Keywords: | ECR plasma sputter vaccum waveguide yoke |
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