| 氮化铀薄膜的制备及性能研究 |
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| 引用本文： | 陆 雷,肖 红,李芳芳,钟永强,白 彬,刘柯钊. 氮化铀薄膜的制备及性能研究[J]. 稀有金属材料与工程, 2015, 44(8): 1975-1978 |
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| 作者姓名： | 陆 雷 肖 红 李芳芳 钟永强 白 彬 刘柯钊 |
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| 作者单位： | 中国工程物理研究院，四川 绵阳 621900 |
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| 基金项目： | 中国工程物理研究院基金资助 (2011B0301057)；国家自然科学基金资助 (91026016) |
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| 摘 要： | 开展了氮化铀薄膜射频制备及薄膜性能研究,通过优化氮化铀薄膜的制备工艺条件,成功在Si基片上制备了氮化铀薄膜,并利用扫描电镜、原子力显微镜、X射线电子衍射、俄歇电子能谱仪和X射线光电子能谱对氮化铀薄膜进行了表面形貌和结构组分分析。结果表明:利用射频磁控沉积法制备的氮化铀薄膜为比较平整和致密的U2N3和UNxOy的混合相组成,具有一定的抗氧化腐蚀性能。
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| 关 键 词： | 氮化铀；薄膜；磁控溅射 |
| 收稿时间： | 2014-08-22 |
Preparation and Characteristics of Uranium Nitride Thin Films |
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| Lu Lei,Xiao Hong,Li Fangfang,Zhong Yongqiang,Bai Bin and Liu Kezhao. Preparation and Characteristics of Uranium Nitride Thin Films[J]. Rare Metal Materials and Engineering, 2015, 44(8): 1975-1978 |
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| Authors: | Lu Lei Xiao Hong Li Fangfang Zhong Yongqiang Bai Bin Liu Kezhao |
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| Affiliation: | China Academy of Engineering Physics, Mianyang 621900, China |
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| Abstract: | Uranium nitride thin films were prepared on the substrate of Si by a radio frequency magnetron sputtering method. Then the films were characterized by SEM, AFM, XRD and XPS. The results show that the uranium nitride thin films by radio frequency magnetron sputtering are fine and dense adherent, which are composed of U2N3 and UNxOy, possessing a considerable oxidation resistance |
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| Keywords: | uranium nitride films magnetron sputtering |
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