| 三价铬离子在电沉积过程中的形态 |
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| 引用本文： | 张新, 李惠东, 段淑贞, 孙根生, 刘新宇. 三价铬离子在电沉积过程中的形态[J]. 工程科学学报, 1995, 17(6): 580-583,589. DOI: 10.13374/j.issn1001-053x.1995.06.018 |
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| 作者姓名： | 张新 李惠东 段淑贞 孙根生 刘新宇 |
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| 摘 要： | 研究证明三价铬离子在HCl体系中适应电活性物质是[Cr(H2O)6]3+,不同pH通过溶液中的存在形态而影响Cr3+电沉积过程。同时证实了Cr3+在HCOOH或(NH2)2CO存在时不与三价铬形成配位化合物。
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| 关 键 词： | 三价铬 电沉积 配位化合物 极谱曲线 |
| 收稿时间： | 1995-03-27 |
Species of Trivalent Chromium in the Bath for the Electrodeposition of Chromium |
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| Zhang Xin, Li Huidong, Duan Shuzhen, Sun Gensheng, Liu Xinyu. Species of Trivalent Chromium in the Bath for the Electrodeposition of Chromium[J]. Chinese Journal of Engineering, 1995, 17(6): 580-583,589. DOI: 10.13374/j.issn1001-053x.1995.06.018 |
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| Authors: | Zhang Xin Li Huidong Duan Shuzhen Sun Gensheng Liu Xinyu |
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| Abstract: | The species of the trivalent ions of chromium in the HCl containing systems have been studied. The proper electroactive species was found to be[Cr(H2O)6]3+. The electrodepostion of chromium was found to be strongly affected by the pH of the bath due to the different species of trivalent chromium at different pH, and coordination compounds of Cr3+ with HCOOH or(NH2)2CO were not found. |
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| Keywords: | trivalent chromium electroplating coordination compounds polargraphic curve |
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