| CNx薄膜的制备和表征 |
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| 引用本文： | 程德刚, 吕反修, 杨莲隐, 宋铂, 佟玉梅. CNx薄膜的制备和表征[J]. 工程科学学报, 1997, 19(1): 100-104. DOI: 10.13374/j.issn1001-053x.1997.01.020 |
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| 作者姓名： | 程德刚 吕反修 杨莲隐 宋铂 佟玉梅 |
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| 摘 要： | 采用在纯氮气氛中磁控溅射高纯石墨靶的方法成功地制备了碳氮薄膜.研究表明,碳氮膜的硬度不仅与薄膜中的氮含量有关,更重要的是与碳氮原子之间的结合状态有关.C≡N键有利于薄膜硬度的提高.高溅射功率和高偏压能促进碳氮叁键的形成,从而提高薄膜硬度.
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| 关 键 词： | 磁控溅射 碳氮薄膜 硬度 |
| 收稿时间： | 1996-12-02 |
Preparation and Characterization of Magnetron Sputtered CNx Films |
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| Cheng Degang, Lu Fanxiu, Yang Lianyin, Song Bo, Tong Yumei. Preparation and Characterization of Magnetron Sputtered CNx Films[J]. Chinese Journal of Engineering, 1997, 19(1): 100-104. DOI: 10.13374/j.issn1001-053x.1997.01.020 |
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| Authors: | Cheng Degang Lu Fanxiu Yang Lianyin Song Bo Tong Yumei |
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| Abstract: | CNx films have been prepared by DC magnetron sputtering of graphite in pure nitrogen atmosphere. N/C ratio is between 0.21 and 0.42, strongly correlating with deposition parameters. The hardness and modulus are related not only to the N/C ratio,but also to the formation and the amount of C≡N triple bonds in the CNx films. High bias voltage and high sputtering power are beneficial to the increase of C≡N bands and so are helpful to increase the hardness and bulk modulus. |
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| Keywords: | magnetron sputtering carbon nitride film hardness |
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