生长温度对CVD金刚石薄膜的影响

系统研究了ＣＶＤ金刚石薄膜成膜过程中生长温度对薄膜质量、生长率和力学性能的影响。研究结果表明：在典型沉积条件下，生长温度愈高、薄膜的晶体质量愈好；但薄膜的应力状况和附着性能变坏；在８００℃时，金刚石薄膜的生长速率最大。讨论了ＣＶＤ金刚石薄膜作为机械工具涂层的最佳生长温度。

Influence of Deposition Temperature on CVD Diamond Films

Influences of deposition temperature on the quality and growth rate, and mechanical properties of diamond films were studied completely. It was shown that under a typical deposition condition, the higher the deposition temperature, the better the films quality, but the worse the films stress state and adhesion. At deposition femperature of about 800℃, the growth rate of CVD diamond film was the maximum. Based on the exprimental results the most optimatic deposition temperature for CVD diamond films acting as mechanical tools coatings was discussed.