Effect of a change in phase of the reflected wave on measurements of the shape of a surface in optical profilometry |
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| Authors: | V L Minaev K E Loshchilov |
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| Affiliation: | (1) Institute for Biology I, Unit of Soil Ecology, RWTH Aachen University, Worringerweg 1, 52056 Aachen, Germany;(2) Technology of Optical Systems (TOS), RWTH Aachen University, Steinbachstr. 15, 52074 Aachen, Germany |
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| Abstract: | We examine the effect of a change in phase of the reflected electromagnetic wave when measuring a surface profile using a
scanning white-light interference microscope and a phase-shifting coherent light interference microscope. We present the results
of experiments measuring the thickness of an aluminum coating deposited on a silicon wafer, without any phase shift correction
and with phase shift correction, calculated from handbook data and from the results of ellipsometric measurements. We compare
with the results of measurements on the same object on an atomic force microscope. |
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