基于Comsol的矩形磁控溅射靶磁场模拟与分析

磁控溅射靶表面磁场分布与靶材刻蚀特性、薄膜沉积均匀性密切相关.为确定合适的磁控靶结构参数以改善靶材表面水平磁场分布均匀性,采用Comsol软件建立矩形平面磁控溅射靶三维模型,对靶材表面磁场分布进行模拟与分析,研究永磁体结构尺寸和磁轭尺寸对磁场分布的作用规律,得到靶材表面水平磁场分布均匀、水平磁感应强度范围合理的溅射靶结...

Simulation and Analysis of Magnetic Field of Rectangular Magnetron Sputtering Target by Comsol

The distribution of magnetic field on the surface of magnetron sputtering target is closely related to the etch morphology of target and the uniformity of thin film deposition.In order to find reasonable structural parameters to improve the uniformity of the distribution of horizontal magnetic field,the three-dimensional of rectangular plane magnetron sputtering target were established by Comsol software.The effect of permanent magnet structure size and magnetic yoke size on the distribution of magnetic field was studied,and the sputtering target structure parameters with uniform horizontal magnetic field distribution and reasonable horizontal magnetic induction intensity range were obtained.The research improves the accuracy of magnetic field simulation of target and plays a guiding role in the selection of structural parameters of magnetron sputtering target.