| 非晶态铁电薄膜的铁电相转变 |
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| 引用本文： | 杨平雄,邓红梅.非晶态铁电薄膜的铁电相转变[J].材料研究学报,1999,13(2):221-224. |
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| 作者姓名： | 杨平雄 邓红梅 |
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| 作者单位： | [1]中国科学院上海技术物理研究所红外物理国家重点实验室 [2]中国科学院上海冶金研究所 |
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| 摘 要： | 用ＡｒＦ脉冲激光在Ｐｔ／Ｔｉ／ＳｉＯ２／Ｓｉ衬底上合成了非晶态ＳｒＢｉ２Ｔａ２Ｏ９铁电薄膜，研究了铁电相转变。采用常规热退火、激光诱导和低温高压水热法使非晶态ＳＢＴ薄膜发生铁电相转变。
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| 关 键 词： | 铁电薄膜 PLD SBT 非晶态 铁电相转变 薄膜 |
RECRYSTALLIZATION TECHNOLOGY FOR AMORPHOUS FERROELECTRIC THIN FILMS |
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| YANG Pingxiong, DENG Hongmei,ChU Junhao.RECRYSTALLIZATION TECHNOLOGY FOR AMORPHOUS FERROELECTRIC THIN FILMS[J].Chinese Journal of Materials Research,1999,13(2):221-224. |
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| Authors: | YANG Pingxiong DENG Hongmei ChU Junhao |
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| Affiliation: | YANG Pingxiong; DENG Hongmei;ChU Junhao |
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| Abstract: | SrBi2Ta2O9 amorphous ferroelectric thin films were synthesised on Pt/Ti/SiO2/Sisubstrate by ArF pulsed laser deposition. The recrystallization for amorphous ferroelectric thin films werestudied. The SBT thin films were crystallized using usual annealing, laser induced and low temperature,high pressure hydrothermal. |
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| Keywords: | ferroelectric thin films PLD SBT |
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