| PG-510型单面抛光机的研制 |
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| 引用本文： | 刘涛,高慧莹,罗杨,费玖海.PG-510型单面抛光机的研制[J].电子工业专用设备,2010,39(8):11-15,19. |
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| 作者姓名： | 刘涛 高慧莹 罗杨 费玖海 |
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| 作者单位： | 中国电子科技集团公司第四十五研究所,北京东燕郊,101601 |
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| 摘 要： | 介绍了针对蓝宝石衬底表面纳米级抛光工艺而研制的PG-510单面抛光机的主要结构及其性能特点,简要论述了抛光过程中各工艺参数的控制方案,并通过实验验证了设备的主要性能指标,能够满足蓝宝石衬底表面纳米级抛光的工艺要求。
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| 关 键 词： | 蓝宝石 纳米级抛光 CMP工艺 |
The design and Development of the PG-510 model Single Side Polishing Machine |
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| LIU Tao,GAO Huiying,LUO Yang,FEI Jiuhai.The design and Development of the PG-510 model Single Side Polishing Machine[J].Equipment for Electronic Products Marufacturing,2010,39(8):11-15,19. |
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| Authors: | LIU Tao GAO Huiying LUO Yang FEI Jiuhai |
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| Affiliation: | LIU Tao,GAO Huiying,LUO Yang,FEI Jiuhai (The 45th Research Institute of CETC,East Yanjiao,Beijing 101601,China) |
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| Abstract: | This article introduces the configuration and characteristic of the PG-510 single side polish-ing machine used for the sapphire ultra-planarization surface. This paper describes some control meth-ods for the polishing process parameters, and proves that this device can meet the requirements of nano-scale scratches. |
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| Keywords: | Sapphire Nano-scale scratches Polishing process |
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