Factors affecting the sensitivity of e-beam resists

In order to determine the effects of chemical structure on electron beam resist sensitivities, a series of polymers with different reactive components and additives has been investigated. The results, based on a larger number of exposures varying over five orders of magnitude, point out several interesting facts. The data indicate that the sensitivity of negative resists is not a linear function of molecular weight as previously supposed. Also, the negative electron resists tend to be more sensitive and cover a broader range of sensitivities than positive resists. The results further show that olefin and epoxy groups greatly enhance the crosslinking rate of these exposed polymers. However, additives, which are good energy transferring type sensitizers, have little effect on resist sensitivity. This last result is not surprising considering the nonselectivity of the exciting electrons.