退火对铪掺杂类金刚石薄膜结构和力学性能的影响

退火可以改善材料的微结构，增加其韧性和释放其内应力。采用双靶共溅技术制备了铪掺杂类金刚石薄膜（HfDLC）样品，并对样品进行了不同温度的退火处理，研究了薄膜退火前后的形貌、键合结构和硬度和摩擦性能等的变化。结果表明，Hf-DLC薄膜中Hf与C形成纳米晶HfC；在250℃条件下退火，薄膜仍比较稳定；300℃退火后，薄膜结构开始发生变化，表面颗粒增大、变得粗糙；退火温度达到350℃以上，薄膜的结晶性变好，HfC结构增加。薄膜的硬度随着退火温度的增加先略有减小而后增加，薄膜与基体间的结合得到改善，这是由于薄膜的结构随退火温度发生改变所致。

Effect of Annealing on the Structure and Mechanical Properties of Hafnium-Doped Diamond-Like Carbon Films

Annealing can improve the microstructure of the material,increase its toughness,and release its internal stress.The hafnium-doped diamond-like carbon(Hf-DLC)films were prepared by the dual-target co-sputtering technology,and they were annealed at different temperatures.The morphology,bonding structure,hardness,and friction properties of the films before and after annealing were studied.The results show that Hf and C in the Hf-DLC films formed nano-crystalized HfC.The Hf-DLC films are stable at an annealing temperature of 250℃.After annealing at 300℃,the structure of the films begins to change,and the surface particles increase and become rough;when the annealing temperature is above 350℃,the crystallinity of the films is better,and the HfC structure in the films increases.The hardness of the films first decreases and then increases with the annealing temperature,and the film-substrate bonding is improved.This is because the structure of the film changes with the annealing temperature.