XPS study of carbon nitride films deposited by hot filament chemical vapor deposition using carbon filament |
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Authors: | Masami Aono Shinichiro Aizawa Nobuaki Kitazawa Yoshihisa Watanabe |
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Affiliation: | National Defense Academy, Materials Science & Engineering, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan |
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Abstract: | Amorphous carbon nitride, a-CNx, thin films were deposited by hot filament CVD using a carbon filament with dc negative bias voltage on the substrate. The effects of the negative bias and the filament components on the binding structure of the films are investigated by XPS. The composition ratio of graphite to amorphous carbon in the filaments affects the bonding structure of carbon and nitrogen in the films, although the nitrogen content in the films is almost same as 0.1. The nitrogen content in the films changes from 0.1 to 0.3 as the negative bias changes from 0 to − 300 V. |
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Keywords: | Amorphous materials Carbon nitride XPS Binding energy |
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