Comparative analysis of film formation in glow-discharge plasma in mixtures of methane with neon and argon |
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Authors: | I V Soldatova V A Kotenev |
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Affiliation: | 1.Moscow State Industrial University,Moscow,Russia;2.Frumkin Institute of Physical Chemistry and Electrochemistry,Russian Academy of Sciences,Moscow,Russia |
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Abstract: | Concentrations of Ne, Ar, and H atoms in metastable and resonance states, concentrations of atomic hydrogen, and the growth
rates of polymer films were determined in the dc glow discharge in the Ne and Ar mixtures with (1–5) % CH4 in the pressure range of 13–520 Pa and discharge currents of 5–100 mA. The method of ellipsometry was used to control the
refraction index and thickness and the composition of polymer films was analyzed with the help of the IR spectroscopy method.
Mathematical simulation of discharges under the given conditions was performed. The calculation results were compared to the
experimental data. It is shown that the mechanism of the ionization and dissociation processes in discharges with mixtures
containing Ne differ considerably from the mechanism of these processes in discharges in mixtures with Ar, which significantly
affects the film formation processes. Prolonged tests under ambient conditions showed the high stability of most of the films
grown under the discharge in the mixtures of Ar and CH4 (the film refraction index in the case of conditioning up to 10 years decreased by about 0.1 within the measurement error)
and in mixtures of Ne with CH4 (the film refraction index under prolonged conditioning features remains almost unchanged). |
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