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Effect of aluminum doping on electrical and dielectric aging behavior against current impulse of ZPCCY-based varistors
Authors:Choon-Woo Nahm
Affiliation:(1) Semiconductor Ceramics Lab., Department of Electrical Engineering, Dongeui University, Busan, 614-714, Korea
Abstract:The electrical and dielectric aging behavior against current impulse (5–1,200 A) in the Zn-Pr-Co-Cr-Y-based varistors was investigated with aluminum doping level (0–0.01 mol%). The varistors doped with 0–0.001 mol% Al were destroyed at higher current impulse beyond 900 A and the varistors doped with 0.005–0.01 mol% Al exhibited high stability against current impulse. The clamp ratio (K) at given current impulse ranges decreased with increasing Al doping level. The varistor doped with 0.01 mol% Al exhibited the lowest K value, with 1.65 at a current impulse of 10 A and 2.38 at a current impulse of 1,200 A. The best electrical and dielectric stability against current impulse of 1,200 A was obtained at 0.01 mol% Al, where %Updelta E1  textmA/cm2 = -3.4%%Updelta E_{1;text{mA/cm}^2} = -3.4%, %Δα = 0%, %ΔJ L = −26.3%, %Δε′APP = +3.4%, and %Δtanδ = −7.7%. Conclusively, Al doping level was optimized at 0.01 mol% in terms of the surge withstand capability (SWC).
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