| CeO2纳米粒子抛光液分散稳定性及其化学机械抛光特性研究 |
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| 引用本文： | 陈广林,刘德福,陈涛,佘亦曦.CeO2纳米粒子抛光液分散稳定性及其化学机械抛光特性研究[J].表面技术,2016,45(11):187-193. |
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| 作者姓名： | 陈广林 刘德福 陈涛 佘亦曦 |
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| 作者单位： | 中南大学机电工程学院,长沙,410083;中南大学机电工程学院,长沙410083;高性能复杂制造国家重点实验室,长沙410083 |
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| 基金项目： | 国家自然科学基金项目（51275534） ；湖南省自然科学基金项目（2015JJ2153） |
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| 摘 要： | 目的制备性能优良的CeO_2纳米粒子抛光液。方法通过使用不同种类及不同浓度的分散剂制备了一种良好的CeO_2纳米粒子抛光液,采用激光粒度仪,紫外可见分光光度仪等对其进行了表征,进而研究了其在石英玻璃片化学机械抛光中的特性。结果不同分散剂的分散作用不同,且分散剂的浓度直接影响分散效果。离子型分散剂主要通过静电稳定作用实现抛光液的分散稳定,而非离子型分散剂则通过空间位阻作用实现抛光液的分散稳定。阴离子型分散剂与非离子型分散剂的分散稳定效果明显强于阳离子型分散剂,而阴离子型分散剂与非离子型分散剂混合复配后的分散稳定效果又强于单一分散剂的效果。结论混合复配型分散剂配制的CeO_2纳米粒子抛光液静置72 h后仍分散均一稳定,基本可以满足抛光液分散稳定性能的要求。配制的CeO_2纳米粒子抛光液在石英玻璃化学机械抛光中主要通过纳米粒子的吸附作用实现材料的去除,抛光后的石英玻璃表面无划痕,表面粗糙度可以达到10 nm左右,有效提高了石英玻璃的抛光质量。
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| 关 键 词： | 抛光液 分散性 表面活性剂 化学机械抛光 吸光度 Zeta电位 |
| 收稿时间： | 2016/3/17 0:00:00 |
| 修稿时间： | 2016/11/20 0:00:00 |
Dispersion Stability of CeO2 Nano Particles Polishing Agent and Its Properties in Chemical Mechanical Polishing Process |
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| CHEN Guang-lin,LIU De-fu,CHEN Tao and SHE Yi-xi.Dispersion Stability of CeO2 Nano Particles Polishing Agent and Its Properties in Chemical Mechanical Polishing Process[J].Surface Technology,2016,45(11):187-193. |
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| Authors: | CHEN Guang-lin LIU De-fu CHEN Tao and SHE Yi-xi |
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| Affiliation: | School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China,1. School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China;2. State Key Laboratory of High Performance Complex Manufacturing, Changsha 410083, China,1. School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China;2. State Key Laboratory of High Performance Complex Manufacturing, Changsha 410083, China and School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China |
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| Abstract: | The work aims to prepare excellent CeO2 polishing agent. A kind of CeO2 nanoparticles polishing agent with excellent polishing properties was prepared by four kinds of dispersants of different concentrations. Its properties were tested by laser particle analyzer, UV-visible spectrophotometer, etc. Its characteristics in CMP of quartz glass sheet were investigated. The test results showed that different dispersing agents had different dispersing functions, and the concentrations of dispersant affected the dispersing results directly. Ionic dispersant achieved stable dispersion of polishing agent mainly by virtue of electrostatic stabilization and the non-ionic dispersant by steric hindrance. The dispersing stability of anionic dispersing (SDBS) and non-ionic dispersant (PVP) was obviously superior to that of the cationic dispersing agent (CTAB). And the dispersing stability of a mixture agent consisting of the anionic dispersant and nonionic dispersant was superior to that of single dispersant. CeO2 nanoparticles polishing agent prepared by mixed dispersing agent keeps uniform and stable dispersion after standing still for 72 hours, meeting the requirements for dispersion stability of polishing agent. When CeO2 nanoparticles polishing agent prepared by methods presented in this paper is used for CMP of quartze glass, the materials are mainly removed by absorption effect of CeO2 nanoparticles. The surface roughness Ra of polished surface is up to 10 nm without scratches and can improve the polishing quality of quartz glass efficiently. |
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| Keywords: | polishing agent dispersity surfactant chemical mechanical polishing absorbancy zeta potential |
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