| 全息图软模压复制用光敏聚合材料 |
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| 引用本文： | 李健芳 安守忠. 全息图软模压复制用光敏聚合材料[J]. 影像技术, 1997, 0(4): 38-41 |
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| 作者姓名： | 李健芳 安守忠 |
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| 作者单位： | 山西大学应用化学研究所!太原030006 |
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| 摘 要： | 本文探讨了一种适用于全息图软模压复制的光敏聚合材料。用丙烯酸和环氧树脂合成了丙烯酸环氧酯。研究了光敏剂和交联剂对光敏聚合材料固化速度和固化膜性能的影响，筛选出光敏聚合材料的最佳配方。
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| 关 键 词： | 光敏聚合材料 浮雕位相型全息图 软模压复制 |
A Sort of Photopolymer Usable in Hologram Soft-Embossing Replication |
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| Li Jianfang, An Shouzhong, Jiao Yong, Chang Yubin. A Sort of Photopolymer Usable in Hologram Soft-Embossing Replication[J]. Image Technology, 1997, 0(4): 38-41 |
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| Authors: | Li Jianfang An Shouzhong Jiao Yong Chang Yubin |
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| Abstract: | In this paper a sort of photopolymer material being usable in hologram soft embossing replication was discussed. Epoxy acrylate was synthesised by reacting epoxy resin with acrylic acid. The effects of photoinitiatiors and crosslinking agent on the curing rate and polymer property of the photopolymer material were studied. The best components of the photopolymer material had been selected. |
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| Keywords: | photopolymer materials relief-phase holograms soft-embossing replication |
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