| ITO透明导电薄膜XPS深度剖面分析 |
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| 引用本文： | 范垂祯,谢舒平,杨得全. ITO透明导电薄膜XPS深度剖面分析[J]. 真空与低温, 2001, 7(1): 18-20 |
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| 作者姓名： | 范垂祯 谢舒平 杨得全 |
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| 作者单位： | 1. 豪威科技集团有限公司,广东,深圳,518057
2. 兰州物理研究所,甘肃,兰州,730000 |
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| 摘 要： | 介绍了镀制SiO2的ITO透明导电薄膜的性能特点,描述了用X射线光电谱仪对典型产品深度剖面的分析过程,给出了实验结果.
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| 关 键 词： | ITO透明导电薄膜X射线光谱仪 样品分析 |
| 文章编号： | 1006-7086(2001)01-0018-03 |
| 修稿时间： | 2000-11-06 |
ANALYSIS ON DEPTH PROFILES OF ITO TRANSPARENT CONDUCTIVE FILMS BY XPS |
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| FAN Chuizhen,XIE Shuping,YANG Dequan. ANALYSIS ON DEPTH PROFILES OF ITO TRANSPARENT CONDUCTIVE FILMS BY XPS[J]. Vacuum and Cryogenics, 2001, 7(1): 18-20 |
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| Authors: | FAN Chuizhen XIE Shuping YANG Dequan |
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| Affiliation: | FAN Chuizhen1,XIE Shuping2,YANG Dequan2 |
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| Abstract: | The properties of ITO transparent conductive films coated with SiO2 are introduced.The process of analysis on the depth profiles of the samples by XPS is described and the results are given. |
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| Keywords: | ITO transparent conductive films XPS analysis |
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