Photoelectric properties of ABA‐type triblock copolymers designed using fluorine‐containing polyimide macroinitiators with polyhedral oligomeric silsesquioxane |
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| Authors: | Shuichi Sato Masato Ichikawa Erika Suzuki Hironaga Matsumoto Kazukiyo Nagai |
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| Affiliation: | 1. Department of Electrical and Electronic Engineering, Tokyo Denki University, 5 Senju‐Asahi‐cho, Adachi‐ku, Tokyo, Japan;2. Department of Applied Chemistry, Meiji University, 1‐1‐1 Higashi‐mita, Tama‐ku, Kawasaki, Japan;3. Department of Electronics and Bioinformatics, Meiji University, 1‐1‐1 Higashi‐mita, Tama‐ku, Kawasaki, Japan |
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| Abstract: | 4,4′‐(Hexafluoro‐isopropylidene) diphthalic anhydride‐2,3,5,6‐tetramethyl‐1,4‐phenylenediamine (6FDA‐TeMPD) was synthesized and reacted with polyhedral oligomeric silsesquioxane (POSS) to form an ABA‐type triblock copolymer by atom transfer radical polymerization. The solid‐state and optical properties of the resulting copolymers were systematically investigated, and their electronic states were analyzed. As the POSS concentration increased, the transparency across the entire wavelength range increased. In the ABA‐type triblock copolymers, a new transition was observed between the highest occupied molecular orbital in POSS and the lowest unoccupied molecular orbital in 6FDA‐TeMPD because of their high molecular size dispersion. Since the refractive index of 6FDA‐TeMPD decreased linearly as the POSS concentration increased, the refractive index of the ABA‐type triblock copolymers of 6FDA‐TeMPD with POSS could be easily controlled. POLYM. ENG. SCI., 57:1207–1213, 2017. © 2017 Society of Plastics Engineers |
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