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Comparison of the bias voltage effect and the force effect during the nanoscale AFM electric lithography on the copper thin film surface |
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| Authors: | Ye Yang Jun Lin |
| Affiliation: | The College of Information, Mechanical and Electrical Engineering, Shanghai Normal University, Shanghai, China |
| Abstract: | |
| Keywords: | AFM electric nanolithography tip‐based nanofabrication nanofabrication of the metallic thin film nanoscale scratching nanoscale thermal effect |