The photosensitive properties of polysiloxane acrylate resin containing tertiary amine groups |
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| Authors: | Fang Sun Sheng‐ling Jiang Hong‐guang Du |
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| Affiliation: | 1. College of Science, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China;2. College of Materials Science and Engineering, Beijing University of Chemical Technology, Beijing 100029, People's Republic of China |
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| Abstract: | The photosensitive properties of a novel oligomer, di (N,N‐diacrylolyl)‐α, ω‐diaminopolysiloxane (ANS) with tertiary amine groups and acryloyl groups in its molecular structure were investigated using FTIR and gel yield method. It was noted that the ANS system showed a notable photosensitive property and its photosensitivity in air could be up to16.3 mJ/cm2. The UV‐curing behavior of the ANS was studied by electron spin resonance (ESR). The results showed that amino‐alkyl radicals can be formed by excited BP abstracting hydrogen at a‐carbon bonded with nitrogen in the ANS molecule under UV irradiation, which can mitigate the oxygen inhibition in radical polymerization. It is proven that tertiary amine groups introduced into ANS could boost photosensitivity of the photopolymerization system. The oligomer ANS may find application in photopolymerization to improve the properties of UV‐curing coating materials. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci, 2008 |
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| Keywords: | di (N N‐diacrylolyl)‐α ω ‐diaminopolysiloxane (ANS) photopolymerization ESR sensitization spin trap |
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