| SmCo/Cr磁性薄膜的工艺与性能 |
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| 引用本文： | Hu Yongshi,Wang Xiang,Li Zuoyi,Lin Gengqi,胡用时,王翔,李佐宜,林更琪.SmCo/Cr磁性薄膜的工艺与性能[J].信息记录材料,2001,2(2):11-13. |
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| 作者姓名： | Hu Yongshi Wang Xiang Li Zuoyi Lin Gengqi 胡用时 王翔 李佐宜 林更琪 |
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| 作者单位： | 1. Dept. of Electronic Sci. Tech., Huazhong Univ. of Sci. Tech.,
2. 华中理工大学电子科学与技术系, |
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| 摘 要： | 通过对磁控溅射条件的优化，制备出了较理想的 SmCo(Al,Si)/Cr硬盘磁记录介质。退火处理后又得到较好的硬磁薄膜。结果表明， Sm含量在 31.6％ atm,Cr缓冲层为 66 nm， Sm(CoAlSi)5磁性层为 30 nm等条件下，制得的 Sm(CoAlSi)5/Cr薄膜的矫顽力 (Hc)为 187.8 kA/m(2.36 kOe)，矩形比 (S=Mr/Ms)≈ 0.94;在 500℃保温 25 min退火后，矫顽力 (Hc)达 1042.5 kA/m(13.1 kOe)，矩形比 (S)≈ 0.92。
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| 关 键 词： | 矫顽力 SmCo(Al Si)/Cr薄膜 磁性能 磁控溅射 |
| 修稿时间： | 2000年1月16日 |
Processing and Properties of SmCo/Cr Magnetic Films |
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| Hu Yongshi, Wang Xiang,Li Zuoyi,Lin Gengqi.Processing and Properties of SmCo/Cr Magnetic Films[J].Information Recording Materials,2001,2(2):11-13. |
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| Authors: | Hu Yongshi Wang Xiang Li Zuoyi Lin Gengqi |
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| Abstract: | Sm (CoAlSi)5/Cr films had been prepared as one kind of promising materials for the ultra
high density magnetic recording media by magnetron sputtering under the optimal conditions. They are
also suitable for a variety of applications, from longitudinal recording media to thin film permanent
magnets, through being annealed. When Sm content, Cr underlayer thickness and the thickness of Sm
(CoAlSi)5 magnetic thin film equals 31.6% atm, 66 nm and 30 nm, respectively, Sm(CoAlSi)5/Cr thin
films with coercivity up to 2.36 kOe, Squareness ratio S nearly 0. 94. After being annealed at 500℃ for
25 min, the films with coercivity Hc up to 13.1 kOe, Squareness ratio S about 0.92 were obtained. |
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| Keywords: | Coercivity SmCo(Al Si) thin film Magnetic property Magnetron sputtering |
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