| Abstract: | In order to deposit transparent and hard DLC films, magnetic field was introduced to enhance the plasma density of radiofrequency plasma chemical vapor deposition (RF-PCVD). In this paper, the configuration and computation of external magnetic field B are introduced. The restriction effect of magnetic field B on the charged particles and the effect of magnetic field B on the primary parameters-nonindependent power Pf and self-bias Uz were also studied. The mechanism of how magnetic field B affects self-bias Uz was analyzed. |
