Application of blue laser direct-writing equipment for manufacturing of periodic and aperiodic nanostructure patterns |
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| Affiliation: | 1. Department of Engineering Science, National Cheng Kung University, Tainan City 701, Taiwan;2. Department of Automation Engineering, National Formosa University, Yunlin County 632, Taiwan;1. Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany;2. Physics Department, King Fahd University of Petroleum and Minerals, Dhahran 31261, Saudi Arabia;3. Nuclear and Radiation Physics Lab, Physics Department, Faculty of Science, Mansoura University, 35516 Mansoura, Egypt;4. Technische Universität Dresden, 01062 Dresden, Germany;5. Institute of Applied Physics, Vienna University of Technology, 1040 Vienna, Austria;1. College of Mechanics and Materials, Hohai University, Nanjing 210098, China;2. Department of Mechanical Engineering, Inha University, Incheon 402-751, Republic of Korea;1. Department of Industrial Engineering, University of Rome “Tor Vergata”, 00133 Rome, Italy;2. Department of Electronic Engineering, University of Rome “Tor Vergata”, 00133 Rome, Italy |
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| Abstract: | This study presents the novel development of low cost, highly efficient blue laser direct-writing equipment for using mask-less laser lithography to manufacture periodic and aperiodic nanostructure patterns. The system includes a long-stroke linear motor precision stage (X, Y), a piezoelectric nano-precision stage (Y, θz), a 3-DOF (degrees of freedom) laser interferometer measurement system, and a blue laser direct-writing optical system. The 3-DOF laser interferometer measurement system gives the control system feedback for displacement (X, Y, θz) of the equipment. The laser processing equipment consists of a blue laser direct-writing optical head, a field-programmable gate array (FPGA) alignment interface, and an optical head servo controller. The optical head operates at a wavelength of 405 nm. Processing the nanostructures on thermo-reaction inorganic resists with precise control of the laser intensity, taking advantage of the threshold effect to exceed the limitations of optical diffraction, and reduces the nanostructure hole size. The equipment can be used to fabricate various periodic nanostructure patterns, aperiodic nanostructure patterns, and two-dimensional patterns. The equipment positioning accuracy is within 50 nm at a speed of 50 mm/s, and the minimum critical dimension can be achieved about 100 nm or so. |
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| Keywords: | Laser direct-writing Positioning stage Nano-precision stage Linear motor precision stage Nanostructure Laser interferometer |
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