Morphology study of oriented SmBCO film deposited by MOCVD |
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| Authors: | Ting Wang Rong Tu Wang Ke Song Zhang Lianmeng Zhang Takashi Goto |
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| Affiliation: | 1.State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology,Wuhan,China;2.Institute for Materials Research,Tohoku University,Sendai,Japan |
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| Abstract: | c-axis-oriented SmBa2Cu3O7 (SmBCO) films have been deposited on (100)- LaAlO3 (LAO) substrate by metal organic chemical vapor deposition (MOCVD) technique. The effects of deposition temperature (T dep) and total pressure (P tot) on the orientation and microstructure of SmBCO films were investigated. The orientation of SmBCO films transformed from a-axis to c-axis with increasing of T dep from 900 to 1 100 °C. At T dep = 1 050 °C, SmBCO films had c-axis orientation and tetragon surface. At P tot= 400-800 Pa and T dep = 1 050 °C, totally c-axis-oriented SmBCO films were obtained. The R dep of SmBCO films increased firstly and then decreased with increasing P tot. The surface of SmBCO films exhibited tetragon morphology at 1 050 °C and 400 Pa. Maximum thickness of SmBCO film deposited was 1.2 μm at P tot = 600 Pa, and the corresponding R dep was 7.2 μm·h-1. |
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