| XeI~*准分子紫外光源的发光特性研究 |
| |
| 引用本文： | 李朝阳,陈强,代立新,林辉创.XeI~*准分子紫外光源的发光特性研究[J].信息记录材料,2009,10(1). |
| |
| 作者姓名： | 李朝阳 陈强 代立新 林辉创 |
| |
| 作者单位： | 北京印刷学院,等离子体物理与材料实验室,北京,102600 |
| |
| 基金项目： | 北京市教委科技面上项目 |
| |
| 摘 要： | 采用石英做介质阻挡层,对高气压XeI*准分子紫外光源进行了实验研究,从放电功率、放电频率、总气压、气体配比等参数分析了光源的工作特性,其最佳工作参数为总气压320Torr、I2分压0.37%,电源频率58.7kHz。在此条件下当放电电压4.6kV、功率66W时,在距光源8.5cm处得到的紫外光辐射强度为31.2μW/cm2。
|
| 关 键 词： | 介质阻挡放电 准分子光源 XeI 转化效率 |
The Iuminescent Properties of XeI~* Excimer UV Light Source |
| |
| LI Chao-yang,CHEN Qiang,DAI Li-xin,LIN Hui-chuang.The Iuminescent Properties of XeI~* Excimer UV Light Source[J].Information Recording Materials,2009,10(1). |
| |
| Authors: | LI Chao-yang CHEN Qiang DAI Li-xin LIN Hui-chuang |
| |
| Affiliation: | Plasma physics and material laboratory;Beijing Institute of Graphic Communication;Beijing 102600;China |
| |
| Abstract: | An experimental study on XeI* excimer UV lamp stimulated by dielectric barrier discharge(DBD) was investigated.By using quartz as dielectric barrier layer,the working parameters of this lamp were analyzed from the applied power,discharge frequency,total pressure and the ratio of mixture gases.The optimum condition came with total pressure 320Torr,0.37% iodine ratio and 58.7kHz's frequency.Under the applied voltage 4.6kV,power66W,an UV radiation intensity of 31.2μW/cm2 was obtained at the distance of 8.5cm from the quartz tube. |
| |
| Keywords: | XeI |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
