Ti/TiN复合膜工艺优化及性能研究

利用正交试验和极差分析方法，分析了多弧离子镀Ti／TiN复合膜中工艺参数（弧电流、氮气分压、基体负偏压、钛过渡层厚度）对Ti／TiN复合膜的纳米硬度和膜与基体的结合力的影响及主次关系，并通过正交试验对工艺参数进行了优化。研究表明，氮气分压和弧电流是影响Ti／TiN复合膜纳米硬度的2个最主要因素，膜层与基体的结合力随着弧电流的增加而下降；升高基体负偏压，虽然可以提高Ti／TiN复合膜纳米硬度和膜与基体的结合力，但是高负偏压将急剧升高基体温度，可能导致基体退火；沉积一定厚度的钛过渡层可以显著提高TiN膜层与基体的结合力。

Study of Technology Optimization and Properties of Ti/TiN Complex Coatings

The Ti/TiN multilayer films deposited by vacuum cathodic arc deposition was studied via orthogonal design method, the influence and relation of principal and ordinate of processing parameters (including current of arc source, N_2 partial pressure, bias negative voltage and thickness of Ti transition layer) on nano hardness and adhesion strength between bias and coating of Ti/TiN complex coatings is studied. The results show that orthogonal test is a very effective method of dealing with and analyzing multi-factor(parameter) test; the nano hardness of Ti/TiN complex coatings is influenced mainly by N_2 partial pressure and current of arc source, adhesion strength between bias and coating is decreased with the increase of current of arc source; increasing bias negative voltage not only promote nano hardness and adhesion strength between bias and coating of Ti/TiN complex coatings, but also increase temperature of bias rapidly, even annealing bias; depositing a certain thickness of Ti transition layer can promote adhesion strength between bias and coating greatly.