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纳米球刻蚀技术
引用本文:钟智勇,刘爽,赵文多,李敏姬,张怀武. 纳米球刻蚀技术[J]. 功能材料, 2005, 36(9): 1312-1315
作者姓名:钟智勇  刘爽  赵文多  李敏姬  张怀武
作者单位:电子科技大学,微电子与固体电子学院,四川,成都,610054;电子科技大学光电信息学院,四川,成都,610054
基金项目:国家自然科学基金资助项目(60490290)
摘    要:纳米球刻蚀技术是一种并行的制备纳米点阵的自组装方法,其核心是二维有序纳米胶体球阵列掩膜的制备。本文详细介绍了二维有序纳米胶体球阵列掩膜的各种自组装合成原理与方法,分析了各种工艺参数的纳米阵列的影响。最后,综述了纳米球刻蚀技术的发展状况与趋势。

关 键 词:纳米球刻蚀  纳米阵列  纳米加工
文章编号:1001-9731(2005)09-1312-04
收稿时间:2004-08-30
修稿时间:2005-02-18

Nanosphere lithography technique
ZHONG Zhi-yong,LIU Shuang,ZHAO Wen-duo,LI Min-ji,ZHANG Huai-wu. Nanosphere lithography technique[J]. Journal of Functional Materials, 2005, 36(9): 1312-1315
Authors:ZHONG Zhi-yong  LIU Shuang  ZHAO Wen-duo  LI Min-ji  ZHANG Huai-wu
Abstract:Nanosphere lithography technique was one parallel self-assembly method for fabricating nanostructured arrays,and the key process of the technique was formation of 2D arrays of nanometer colloid spheres through self-assembly. The various methods and principle of self-assembly nanometer colloid spheres were described in detail in this article, and parameters,which influence on the nanostructured arrays were also analyzed. In the end,the status and development of this technique was briefly summarized.
Keywords:nanosphere lithography    nanostructured arrays   nano-processing
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