| 退火温度对二氧化钛薄膜的性能影响 |
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| 引用本文： | 潘长锦,张大伟,王健,卢忠荣.退火温度对二氧化钛薄膜的性能影响[J].光学仪器,2017,39(1):68-72. |
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| 作者姓名： | 潘长锦 张大伟 王健 卢忠荣 |
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| 作者单位： | 上海理工大学光电信息与计算机工程学院,上海,200093 |
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| 基金项目： | 国家重大基础研究计划（973计划）（2015CB352001）；国家自然科学基金（61378060、61205156）；上海市科学仪器重大专项（14142200902） |
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| 摘 要： | 为了获得性能优良的二氧化钛薄膜,采用电子束蒸发沉积方法制备二氧化钛薄膜,并分别在300、600、900℃空气中对样品进行退火处理以改善所制备二氧化钛薄膜的性能。分别采用X射线衍射(XRD)、原子力显微镜(AFM)以及分光光度计研究了退火温度对二氧化钛薄膜结构和光学性能的影响。结果表明,退火处理可以使二氧化钛薄膜由非晶态薄膜转换为金红石型薄膜,且金红石晶型成分随退火温度的加大而增大,同时退火处理可以改善二氧化钛薄膜在300~1 200nm光谱范围的总吸光率以及增大二氧化钛薄膜的应用范围。
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| 关 键 词： | 二氧化钛薄膜 退火温度 X射线衍射(XRD) 原子力显微镜(AFM) 透射率 |
| 收稿时间： | 2016/6/20 0:00:00 |
The influence of the annealing temperature on the properties of titanium dioxide thin film |
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| PAN Changjin,ZHANG Dawei,WANG Jian and LU Zhongrong.The influence of the annealing temperature on the properties of titanium dioxide thin film[J].Optical Instruments,2017,39(1):68-72. |
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| Authors: | PAN Changjin ZHANG Dawei WANG Jian and LU Zhongrong |
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| Affiliation: | School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China,School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China,School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China and School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China |
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| Abstract: | In order to obtain good performance of titanium dioxide thin film,this experiment used electron beam evaporation deposition method to fabricate titanium films.Then the films were annealed at 300 degrees,600 degrees,and 900 degrees to improve the performance of the preparation of titanium dioxide thin film.X-ray diffraction (XRD),atomic force microscope (AFM) and spectrophotometer were used respectively to study the influence of structure and optical properties of titanium oxide film.The results show that the model of the film at room temperature was amorphous but the films after annealing transformed to rutile which is proportional to the annealing temperature.Annealing could also improve the total light absorption of the titanium dioxide thin film in the 300~1 200 nm spectral range.Annealing treatment could broaden the application of titanium dioxide thin film. |
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| Keywords: | TiO2 thin film annealing temperature X-ray diffraction(XRD) atomic force microscope(AFM) transmittance |
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