Correlating discrete orientation and grain size to the sputter deposition properties of tantalum |
| |
Authors: | Christopher A Michaluk |
| |
Affiliation: | (1) Cabot Performance Materials, 19512-1607 Boyertown, PA |
| |
Abstract: | Recent findings indicate that the erosion behavior of tantalum sputtering targets varies across regions of different discrete
crystal orientation. Specifically, bands of sharp, localized (100) texture amid the microstructure and aligned parallel to
the sputtering surface of planar tantalum targets have been shown to resist erosion. Referencing theoretical models and characterization
studies of wrought tantalum, this paper explores the relationship between discrete crystallographic texture and grain size
of tantalum with respect to the physical erosion behavior of tantalum sputtering targets. The findings demonstrate that both
grain size and preferred orientation contribute to the deposition behavior of tantalum. Also, controlling both the microstructural
and textural homogeneity are key to assuring the reliability of Ta targets and the subsequent integrity of the sputter-deposited
thin films. |
| |
Keywords: | Electron backscatter diffraction grain size sputtering tantalum texture |
本文献已被 SpringerLink 等数据库收录! |
|